ИСТИНА

• Охват: Международная
• Даты проведения: 2014
• Место проведения: Yokohama, Japan, Japan
• Описание конференции:

  Photomask Japan 2014 is the 21st international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

• Добавил в систему: Родин Сергей Борисович

Доклады:

• 2014 Use of ILT-based mask optimization for local printability enhancement (Пленарный)
• Авторы: Кобельков С.Г., Родин С.Б., Soung-Su Woo, Kyohei Sakajiri, Evgueni Egorov, Alexander Tritchkov