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This workshop is the 8th in a series devoted to plasma etch and strip processes for micro- and nano-technologies. This year’s workshop will address challenging topics in the field of new materials for emerging nanoscale devices, new sacrificial materials for pattern transfer, new plasma-based patterning techniques, Memory applications & etch of non-volatile materials. The objective of the workshop is to provide a forum for open discussions between science and industrial applications. It is dedicated to scientists, process engineers, post-doc and PhD students. Topics include both fundamental and applied research, as well as issues related to manufacturing, with the progressive downscaling of device dimensions and the simultaneous demand for more functionality. Invited talks will be given by scientific and technical leaders in each of the key areas, who will present the current state-of-the-art and stimulate technical discussions.