ИСТИНА

A recently developed extension of Sparse Colloidal Lithography, an In-situ Resist Colloidal Lithography method is presented. The technique is based on in-situ deposition of structured resist layer having low adhesion to target material to form nanoparticles of desired shape. A high potential of the method is demonstrated by the examples of fabricated plasmonic nanostructures with different shapes, including concentric and non-concentric rings, disks and chiral comma-like particles.