|
ИСТИНА |
Войти в систему Регистрация |
ФНКЦ РР |
||
CVD nanographite films covered by ALD metal oxides: structural and field emission propertiesстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 10 октября 2015 г.
- Авторы: Ismagilov Rinat R., Tuyakova Feruza T., Kleshch Victor I., Obraztsova Ekaterina A., Obraztsov Alexander N.
- Журнал: Physica Status Solidi (C) Current Topics in Solid State Physics
- Том: 12
- Номер: 7
- Год издания: 2015
- Первая страница: 1022
- Последняя страница: 1027
- DOI: 10.1002/pssc.201510022
- Аннотация: Nanographite films produced by direct current plasma enhanced chemical vapour deposition technique were covered by metal oxides TiO2 and Al2O3 using atomic layer deposition. Nanographite films are composed of few-layer graphene nanowalls and nanoscrolls, which are mostly oriented perpendicular to the silicon substrate surface. The nanographite and nanographite-metal oxide composite film materials, with oxide layer thickness between 50 nm and 250 nm, were characterized by scanning electron microscopy, energy dispersive X-ray analysis, thermal gravimetric analysis, and Raman spectroscopy. We demonstrate that the metal oxide deposit homogenously covers graphene nanowalls and forms individual spherical particles on the surface of needle-like nanoscrolls. Field emission properties of the samples were measured in a flat vacuum diode configuration. It was found that the metal oxide layers thinner than 200 nm do not significantly affect the field emission characteristics of the nanographite. At the same time, metal oxides form a passivation shell which may improve the nanographite film performance as cold cathode in vacuum electronic devices.
- Добавил в систему: Исмагилов Ринат Рамилович