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Influence of Zn+-Ion Implantation on the Process of Sapphire Charging by an Electron Beamстатья
Информация о цитировании статьи получена из
Web of Science
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 6 декабря 2018 г.
- Авторы: Tatarintsev A.A., Privezentsev V.V., Rau E.I., Goryachev A.V.
- Журнал: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
- Том: 12
- Номер: 2
- Год издания: 2018
- Издательство: Pleiades Publishing, Ltd
- Местоположение издательства: Road Town, United Kingdom
- Первая страница: 213
- Последняя страница: 216
- DOI: 10.1134/S1027451018020143
- Аннотация: The influence of Zn ions implanted in a sapphire single crystal on the kinetics of attainment of the equilibrium state of the surface potential and current characteristics is considered. To consider the influence of the surface state on the dielectric charging process, one of the samples is annealed in an oxygen atmosphere to form ZnO on the surface. The obtained results show a significant increase in the rate of attainment of the equilibrium surface potential after ion implantation. To understand the obtained results, the dependence of the concentration of the doping impurity as a function of the crystal depth is measured. The possible mechanisms affecting a change in achievement of the potential are discussed.
- Добавил в систему: Татаринцев Андрей Андреевич