Plasma CVD characterization of nanocarbon film growthстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:We report on the characterization of d.c. discharge plasma-enhanced chemical vapour deposition of nanocarbon film materials in a hydrogen-methane gas mixture. The effects of the gas composition and pressure on the current-voltage characteristics and optical emission spectra of the discharge plasma are studied. By varying the parameters we obtain various carbon thin-film materials, the structure and composition of which are characterized qualitatively by Raman spectroscopy and electron microscopy. The data obtained by optical emission spectroscopy show the presence of H, H-2, CH and C-2 activated species in the discharge plasma. We assume that C-2 dimers play a decisive role in nanostructured graphite-like carbon film formation and carbon condensation in the gas phase. Copyright (C) 2004 John Wiley Sons, Ltd.