Dispersion of optical anisotropy in nanostructurized silicon filmsстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:Optical characteristics of (110) oriented porous silicon films obtained by electrochemical etching are studied. Dispersion of refractive indices, dichoroism in the visible range of the spectrum, depolarization factor, and porosity of silicon films are measured. It is shown that the results obtained may be described based on the generalized Bruggeman model. Possible causes of the established discrepancies between the experimental data and the model are discussed. (C) 2004 MAN "Nauka/Interperiodica".