Relaxation Phenomena in Films of Chitosan of Various Chemical Formsстатья
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Дата последнего поиска статьи во внешних источниках: 27 февраля 2020 г.
Аннотация:Inner friction spectra are obtained and analyzed for various chemical structures of chitosan—temperature dependence of logarithmic damping factor of free torsion motion λ = f(Т) and temperature change of their frequency ν = f(Т) within the range from –150°С to 300°С. In basic and salt forms of chitosan, three intense local dissipative phenomena are revealed. It was found that each local dissipative process has correspondent characteristic change of frequency of oscillating process, stimulated in chitosan samples. This fact allowed one to reveal and theoretically analyze the change of shear modulus defect both for local temperature ranges and for the entire chitosan system as a whole.