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Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Depositionстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 24 ноября 2021 г.
- Авторы: Dedkova A.A., Dyuzhev N.A., Kireev V.Yu, Klemente I.E., Myakon'kikh A.V., Rudenko K.V.
- Журнал: Nanotechnologies in Russia
- Том: 13
- Номер: 9-10
- Год издания: 2018
- Издательство: Pleiades Publishing, Ltd
- Местоположение издательства: Road Town, United Kingdom
- Первая страница: 502
- Последняя страница: 507
- DOI: 10.1134/S199507801805004X
- Аннотация: The effect of laser radiation with a wavelength of 970 nm and a power density of 0.29-2.10 W/cm(2) on the process of atomic layer deposition of alumina films from precursors (trimethylaluminium + water vapor) is studied. Laser irradiation is performed at the stages of reactor purging after the introduction of precursors. The results of a comprehensive analysis involving spectral ellipsometry, atomic force microscopy, X-ray diffractometry, and secondary-ion mass spectrometry have revealed that laser irradiation (i) does not alter the rate of deposition of alumina films onto silicon slices; (ii) does not alter the surface relief (roughness) of alumina films; (iii) does not alter the depth profile of the chemical composition of alumina films; (iv) reduces the average density of irradiated regions of alumina films by 5-10% relative to the density of nonirradiated regions.
- Добавил в систему: Дедкова Анна Александровна