Аннотация:In this paper we study the process of plasma enhanced chemical vapor deposition (PECVD) of carbon nanostructures in the form of a film, the pillars, the flakes at a temperature of 100-350 degrees C from the vapor-gas mixture H-2+CO+Ar. Also in the paper presents the structural features of the carbon nanopillars obtained at 250 degrees C. Determined mechanical stresses occurring during the growth of carbon nanostructures. Investigated the features of the growth of carbon pillars and proposed a phenomenological description of the process of their formation during PECVD process.