On the Formation of a Relief on the Surface of Tantalum during Its SinteringстатьяИсследовательская статья
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Дата последнего поиска статьи во внешних источниках: 11 мая 2022 г.
Аннотация:Structural changes in FTW60 and FTW8000 tantalum capacitor powders after sintering at differenttemperatures are investigated by X-ray diffraction and scanning electron microscopy. Sintering is carried outin accordance with the current technological process used in the production of oxide–semiconductor capacitors.The anodes obtained as a result of sintering are bulk-porous bodies in the form of a rectangular parallelepipedwith a wire lead. On the free surface of the bulk-porous anodes obtained by sintering the FTW60powder at temperatures of 1800°C and 1920°C, the formation of a wavy relief is observed. No such relief isobserved after sintering the FTW800 powder at 1250°C. After analyzing the structural state and the morphologyof the initial powders and the anodes obtained as a result of sintering, a phenomenological model of theformation of such a relief is proposed based on collective recrystallization near the free surface during high-temperatureexposure.