Аннотация:The spatial distribution of reflected particles was experimentally studied in the case of oblique incidence of 4.5 keV Ar ions on a (110) and (100) planes.The distribution of ejection angles of the reflected particles was found to have several peaks and minima. To explain the results of these experiments a computer study was performed. The shape of the calculated spatial distribution curves arrears to be very sensitive to variations of the constants in the interaction potentials. Some features of the spatial distribution of reflected ions have been shown to be connected to the motion of ions in surface semichannels. The spatial distribution of the neutral component of scattered and sputtered particles was also studied in the experiments. A predominant yield of the sputtered particles was observed not only in the low-index but also in high-index directions.