Low Pressure rf hybrid discharge

Alexandrov, A.F.; Vavilin, K.V.; Kralkina, E.A.; Pavlov, V.B.; Savinov, V.P.; Rukhadze, A.A.; Nekludova, P.A.; Petrov, A.K.; Zhao, C.

Авторы: Alexandrov A.F., Vavilin K.V., Kralkina E.A., Pavlov V.B., Savinov V.P., Rukhadze A.A., Nekludova P.A., Petrov A.K., Zhao Ch
Сборник: Book of Abstracts 4th Workshop on Radio Frequency Discharges
Тезисы
Год издания: 2013
Место издания: France
Первая страница: 22
Последняя страница: 22
Аннотация: Capacitive and inductive RF discharges are widely used nowadays in the industrial applications. It is well known that in the capacitive discharge the near electrodes sheaths are formed where the time-averaged potential drop takes place. Due to the presence of the potential drop ions are accelerated towards electrodes while electrons are accelerated towards bulk plasma. Bombardment of the electrodes surface by energetic ions leads to a number of attractive for applications surface reactions such as implantation, surface modification, etching, etc. The penetration of the fast electrons into bulk plasma leads to the enhancement of the wide class of the plasma-chemical reactions. The limitation of the capacitive discharge from the point of view of industrial applications is the relatively low electron density existing in the plasma volume and thus low rate of technological processes. Significantly higher values of electron density are typical for the inductive RF discharge. In order to overcome the limitations of the capacitive discharge several models of plasma reactors [1] where developed where the discharge was sustained by the current flowing in the inductor while the substrate was RF biased in order to organize the flow of energetic ions towards it. As a rule inductive and capacitive components of such discharge are regarded as independent. The study carried out in [2] showed that the presence of the capacitive channel in the inductive discharge leads to the change of the power coupled to plasma through the inductive channel while the presence of the inductive channel influences the value of the near-electrode potential drop. This provides additional possibilities for discharge parameters control. Being the natural continuation of [2] the present paper deals with the study of the new modification of RF discharge, i.e. hybrid RF discharge where the RF power is coupled to plasma through inductive and enhanced capacitive channel. The present paper deals with the study of a new modification of RF discharge, i.e. hybrid RF discharge possessing both inductive and capacitive components. To organize the discharge the RF power input unit comprising connected in parallel spiral antenna and the capacitor plates located on the side and end surfaces of the plasma source was used. It was shown experimentally and by numerical simulation that the existence of the capacitive channel of the discharge influences the power input through the inductive discharge while the inductive channel influences the potential drop existing near the plates of the capacitive channel. The change of the RF generator power led to the self-consistent redistribution of the power coupled to plasma through the inductive and capacitive channel. The dividing capacitor connected in series with capacitor plates gave the opportunity to control plasma parameters smoothly. This opens the possibilities for utilization of the hybrid RF discharge as basic process for new generation of plasma reactors. REFERENCES 1. Lieberman M. A., Lichtenberg A. J., Principles of plasma discharges…, 2005, 757p. 2. Kralkina E.A. Physics-Uspekhi (Advances in Physical Sciences), 178 519–540 (2008).
Добавил в систему: Петров Александр Кириллович

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