Epitaxial Calcium and Strontium Fluoride Films on Highly Mismatched Oxide and Metal Substrates by MOCVD: Texture and Morphologyстатья
Статья опубликована в высокорейтинговом журнале
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Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:The growth of epitaxial CaF(2) and SrF(2) thin films on single crystalline r-cut sapphire, MgO (001) and biaxially textured Ni-W polycrystalline tape by low-temperature MOCVD is reported. A novel and efficient combination of alkaline-earth and fluorine precursors was used for deposition. A comprehensive study regarding the out- and in-plane orientation of the films and their surface morphology is presented using X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), energy-dispersive X-ray analysis (EDX), field-emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and electron backscatter diffraction (EBSD). The grown films are shown to have different crystallographic orientation depending on the film-substrate lattice mismatch and growth rate. Both types of films were obtained with pure c-axis orientation on all used substrates by either choosing the appropriate deposition conditions or postdeposition treatment. Epitaxial relations for all grown films are determined. A film-substrate interaction is described for the case of Ni-W substrate; a way to avoid it is proposed and successfully implemented. Certain growth conditions are shown to result in a unique three-dimensional ordered nanogrid structure of the films, making them perfect nanotemplated substrate for the epitaxial growth of other functional layers.