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Diffusion in glasses used for production of siliconстатья
- Авторы: Kreisberg V.A., Spivakova N.Ya
- Сборник: Proceedings of the XVII International Congress on Glass, 9-14 October, 1995, Beijing, China
- Том: 3
- Год издания: 1995
- Место издания: Chinese Ceramic Society, Beijing, China
- Первая страница: 51
- Последняя страница: 56
- Аннотация: Gas release from silica glasses of crucibles for silicon crystal growth has been researched by mass spectrometry. The basic impurity in all investigated glasses is water (structural OH-groups and molecular water). Diffusion coefficients for the evolution water impurity have been determined at 800-1400 C. Silica glasses used for manufacture of large single silicon crystals should be characterized by the minimal water and gas content and by the minimal diffusion coefficient.
- Добавил в систему: Крейсберг Валерий Абрамович