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Метод скрещенных пучков для напыления пленок кремниястатья
- Авторы: Хайдуков Е.В., Лотин А.А., Рочева В.В., Новодворский О.А., Панченко В.Я.
- Сборник: Труды 2 Всероссийской научной школы для молодежи «Концентрированные потоки энергии в индустрии наносистем материалов и живых систем»
- Год издания: 2009
- Место издания: Москва МИЭМ Москва
- Первая страница: 94
- Последняя страница: 100
- Аннотация: The erosion plume from the silicon target has been investigated bу the Langmuir probe method. The YAG: Nd3+ laser (λ=1.06 μm) was used for ablation. The time-of-flight ion curves of the plasma plume formed by crossed plumes from two targets (crossed-beam pulsed laser deposition method (CBPLD)) and the curves of the erosion plume from one Si target have been obtained. The research has been performed for the probe-target distances in the 40-157 mm range. The angular distribution of the plasma plume ions formed by crossed plumes has been obtained. For the free of drops area the Si film thickness distribution relative to the plasma plume axis has been received. The analysis by atomic-force microscopy (AFM) method showed high surface quality of the obtained Si films. At 300 0C substrate temperature the roughness does not exceed 1 nm.
- Добавил в систему: Панченко Владислав Яковлевич