Аннотация:This paper investigates the effect of alpha-particle irradiation on the memristive properties of titanium oxide-based structures. Multilayer TiOx/Ti structures were fabricated by magnetron sputtering and subjected to alpha-particle irradiation with a fluence of 2 × 10^12 ions/cm^2. Defect formation was modeled using the Monte Carlo method. The memristive characteristics of the structures were studied before and after bombardment. Ion bombardment was found to increase the number of stable resistive states by nearly three times, extend the number of switching cycles by 1.5 times, and significantly enhance the ROFF/RON ratio. This optimization of memristive parameters is attributed to the formation of locally created defects.
