Sputtering of W and Al in D2/O2 plasma cleaning dischargeстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 3 декабря 2017 г.
Аннотация:Ion sputtering of W, Al, and Be (in several experiments) in a low pressure DC discharge in D-2/O-2 mixtures was studied. Ion energy was varied by electrical biasing of the samples from -100 to -600 V with respect to the plasma. At a bias of -100 V the sputtering yields peaked with an addition of 2-4 mol.% oxygen reaching (4 +/- 0.5) x 10(-3), (12 +/- 1) x 10(-3), and (20 +/- 2) x 10(-3) Me at./ion for W, Al, and Be, respectively. It is supposed that chemical nature of W, Al, and Be sputtering in D-2/O-2 plasma is caused by formation of weakly bound surface oxides and hydroxides under impinging of reactive deuterated ions (D3O+, D-3(+)). (C) 2014 Elsevier B.V. All rights reserved.