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Статьи в журналах
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- 2020 Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
- Zyulkov I., Voronina E.N., Krishtab M., Voloshin D.G., Chan B.T., Mankelevich Yu A., Rakhimova T.V., Armini S., De Gendt S.
- в журнале Materials Advances, издательство Royal Society of Chemistry (United Kingdom), № 1, с. 3049-3057 DOI
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- 2020 Area-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films
- Zyulkov I., Madhiwala V., Voronina E., Snelgrove M., Bogan J., O’Connor R., de Gendt S., Armini S.
- в журнале ACS applied materials & interfaces, издательство American Chemical Society (United States), том 12, № 4, с. 4678-4688 DOI
Тезисы докладов
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- 2019 Understanding the interaction mechanisms between amorphous carbon sacrificial patterning material and H2 plasma to enable area-selective ALD processes
- Zyulkov I., Voronina E.N., Chan BT, Mankelevich Yu A., Rakhimova T.V., De Gendt S., Armini S.
- в сборнике Book of Asbtract "Plasma Etch and Strip for Microtechnology workshop (PESM 2019)", место издания Grenoble, тезисы