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Тезисы докладов
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- 2023 PLASMA ENHANCED ATOMIC LAYER ETCHING IN Ar/C4F8 INDUCTIVELY COUPLED PLASMA WITH O2 CLEANING STEP
- SHIBANOV D.R., LOPAEV D.V., ZASEEV Y.G., PAVLOV G.Y., RAKHIMOV A.T.
- в сборнике Gas Discharge Plasmas and Their Applications (GDPA-2023): Abstracts of 16th International Conference, место издания Aeterna Ufa, Russia, тезисы, с. G3-O-005905