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Статьи в журналах
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- 2013 Damage Free Cryogenic Etching of a Porous Organosilica Ultralow-k Film
- Liping Zhang, Rami Ljazouli, Philippe Lefaucheux, Thomas Tillocher, Rémi Dussart, Mankelevich Yu A., de Marneffe Jean-François, Baklanov Stefan de Gendt and Mikhail
- в журнале ECS Solid State Letters, том 2, № 2, с. N5-N7 DOI